System and method for cleaning a conditioning device
US8545634B2 · kind B2 · utility
0Cited by
26References
14Claims
0Family size
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Key dates
| Filing date | Oct 19, 2005 |
| Grant date | Oct 1, 2013 |
| Priority date | — |
| Expiry date | Dec 24, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B53/017
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A system for cleaning a conditioning device to improve the efficiency of the conditioning of a polishing pad using the conditioning device as part of a chemical-mechanical polishing process, the system comprising a conditioning device; a fluid dispenser arranged to dispense a fluid on the conditioning device; and an acoustic nozzle arranged to emit a megasonic or ultrasonic signal at the conditioning device while the fluid dispenser is dispensing the fluid on the conditioning device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.