Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
US8546062B2 · kind B2 · utility
6Cited by
4References
16Claims
0Family size
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Key dates
| Filing date | Nov 22, 2011 |
| Grant date | Oct 1, 2013 |
| Priority date | — |
| Expiry date | Nov 22, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/26
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.