Lithographic apparatus and device manufacturing method
US8547519B2 · kind B2 · utility
7Cited by
51References
18Claims
0Family size
Assignee
Inventors
- Bob Streefkerk
- Johannes Jacobus Matheus Baselmans
- Richard Joseph Bruls
- Marcel Mathijs Theodore Marie Dierichs
- Sjoerd Nicolaas Lambertus Donders
- Christiaan Alexander Hoogendam
- Hans Jansen
- Erik Roelof Loopstra
- Jeroen Johannes Sophia Maria Mertens
- Johannes Catharinus Hubertus Mulkens
- Ronald Walther Jeanne Severijns
- Sergei Shulepov
- Herman Boom
- Timotheus Franciscus Sengers
Key dates
| Filing date | Mar 26, 2009 |
| Grant date | Oct 1, 2013 |
| Priority date | — |
| Expiry date | Apr 16, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70958
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.