Methods of patterning a substrate including multilayer antireflection coatings
US8551808B2 · kind B2 · utility
21Cited by
160References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2012 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Sep 13, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24174
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Multi-layer antireflection coatings, devices including multi-layer antireflection coatings and methods of forming the same are disclosed. A block copolymer is applied to a substrate and self-assembled into parallel lamellae above a substrate. The block copolymer may optionally be allowed to self-assemble into a multitude of domains oriented either substantially parallel or substantially perpendicular to an underlying substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.