Showerhead for CVD depositions
US8551890B2 · kind B2 · utility
7Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2012 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Feb 17, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0318
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A CVD showerhead that includes a circular inner showerhead and at least one outer ring showerhead. At least two process gas delivery tubes are coupled to each showerhead. Also, a dual showerhead that includes a circular inner showerhead and at least one outer ring showerhead where each showerhead is coupled to oxygen plus a gas mixture of lead, zirconium, and titanium organometallics. A method of depositing a CVD thin film on a wafer. Also, a method of depositing a PZT thin film on a wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.