Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition
US8557499B2 · kind B2 · utility
2Cited by
7References
18Claims
0Family size
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Key dates
| Filing date | Jul 8, 2010 |
| Grant date | Oct 15, 2013 |
| Priority date | — |
| Expiry date | Jul 4, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that when exposed to actinic rays or radiation, generates any of the acids of general formula (II) below and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid.(The characters used in general formula (I) have the meanings mentioned in the description.)
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.