Developable bottom antireflective coating compositions especially suitable for ion implant applications
US8557501B2 · kind B2 · utility
0Cited by
4References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 21, 2012 |
| Grant date | Oct 15, 2013 |
| Priority date | — |
| Expiry date | Mar 21, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.