Multipurpose acidic, organic solvent based microelectronic cleaning composition
US8557757B2 · kind B2 · utility
0Cited by
15References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2010 |
| Grant date | Oct 15, 2013 |
| Priority date | — |
| Expiry date | Mar 17, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A cleaning composition for cleaning microelectronic or nanoelectronic devices, the cleaning composition having HF as the sole acid and sole fluoride compound in the composition, at least one primary solvent selected from the group consisting of sulfones and selenones, at least one polyhydroxyl alkyl or aryl alcohol co-solvent having metal ion complexing or binding sites, and water, and optionally at least one phosphonic acid corrosion inhibitor compound and the is free of amines, bases and other salts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.