Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system
US8559108B2 · kind B2 · utility
2Cited by
2References
20Claims
0Family size
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Key dates
| Filing date | Dec 19, 2008 |
| Grant date | Oct 15, 2013 |
| Priority date | — |
| Expiry date | Apr 20, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/067
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.