Imprint apparatus and method for producing article
US8562323B2 · kind B2 · utility
4Cited by
0References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2010 |
| Grant date | Oct 22, 2013 |
| Priority date | — |
| Expiry date | Dec 18, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An imprint apparatus is disclosed that forms, by pressing a resin applied onto a substrate and a mold against each other, a pattern on the substrate. The imprint apparatus includes a substrate stage that holds the substrate, and a control unit for controlling the position of the stage by outputting a manipulating variable on the basis of a position error between a position of the stage which has been measured by position measurement unit and a target position. The control unit reduces a ratio of the manipulating variable to the position error while the substrate and the mold are in contact with each other until mold release.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.