System for and method for closed loop electrophoretic deposition of phosphor materials on semiconductor devices

US8563339B2 · kind B2 · utility

Assignee

• Cree, Inc. · US

Inventors

• Eric Tarsa · Goleta, US
• Michael Leung · Goleta, US
• Bernd Keller · Lompoc, US
• Robert D. Underwood · Lompoc, US
• Mark Youmans · Goleta, US

Key dates

• Filing date: Jun 21, 2006
• Grant date: Oct 22, 2013
• Expiry date: Dec 22, 2028

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10H20/0361
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

One close loop system and method for electrophoretic deposition (EPD) of phosphor material on light emitting diodes (LEDs). The system comprises a deposition chamber sealed from ambient air. A mixture of phosphor material and solution is provided to the chamber with the mixture also being sealed from ambient air. A carrier holds a batch of LEDs in the chamber with the mixture contacting the areas of the LEDs for phosphor deposition. A voltage supply applies a voltage to the LEDs and the mixture to cause the phosphor material to deposit on the LEDs at the mixture contacting areas.