Patent · US Active

Method for manufacturing photovoltaic device

US8563351B2 · kind B2 · utility

2Cited by
26References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 25, 2010
Grant dateOct 22, 2013
Priority date
Expiry dateSep 25, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

A photovoltaic device manufacturing method is disclosed. Methods include manufacturing a photovoltaic cell using nanoimprint technology to define individual cell units of the photovoltaic device. The methods can include providing a substrate; forming a first conductive layer over the substrate; forming first grooves in the first conductive layer using a nanoimprint and etching process; forming an absorption layer over the first conductive layer, the absorption layer filling in the first grooves; forming second grooves in the absorption layer using a nanoimprint process; forming a second conductive layer over the absorption layer, the second conductive layer filling in the second grooves; and forming third grooves in the second conductive layer and the absorption layer, thereby defining a photovoltaic cell unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.