Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material
US8568576B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 27, 2009 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Aug 18, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC22C2202/02
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Provided is a sputtering target of nonmagnetic-particle-dispersed ferromagnetic material comprising a phase (A) such that nonmagnetic particles are dispersed in a ferromagnetic material formed from a Co—Cr alloy containing 5 at % or more and 20 at % or less of Cr and Co as the remainder thereof, and schistose textures (B) with a short side of 30 to 100 μm and a long side of 50 to 300 μm formed from a Co—Cr alloy phase in the phase (A); wherein each of the foregoing nonmagnetic particles has such a shape and size that the particle is smaller than all hypothetical circles with a radius of 1 μm around an arbitrary point within the nonmagnetic particle, or a shape and size with at least two contact points or intersection points between the respective hypothetical circles and the interface of the ferromagnetic material and the nonmagnetic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.