JX Nippon Mining & Metals Corporation
486Patents
481Active
486Granted
60Portfolio score
Filing activity: Dec 4, 2002 → Feb 22, 2021 · 137 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8148245B2 | Method for producing a-IGZO oxide thin film | Emerging Cross-Sectional Technologies | 47 | Active |
| US7909949B2 | Sputtering target with few surface defects, and surface processing method thereof | Emerging Cross-Sectional Technologies | 27 | Expired |
| US7927434B2 | Co-Cr-Pt-B alloy sputtering target | Electricity | 23 | Expired |
| US8623551B2 | Positive-electrode active material for lithium ion battery, positive electrode for lithium ion battery, and lithium ion battery | Emerging Cross-Sectional Technologies | 18 | Active |
| US8163063B2 | Method of leaching copper sulfide ore with the use of iodine | Emerging Cross-Sectional Technologies | 17 | Active |
| US7951275B2 | Sputtering target and method for finishing surface of such target | Chemistry; Metallurgy | 16 | Active |
| US8287623B2 | Method of heap or dump leaching of copper from copper sulfide ore | Emerging Cross-Sectional Technologies | 16 | Active |
| US8748041B2 | Positive electrode active material for lithium ion battery | Emerging Cross-Sectional Technologies | 15 | Active |
| US8993160B2 | Positive electrode for lithium ion battery, method for producing said positive electrode, and lithium ion battery | Emerging Cross-Sectional Technologies | 14 | Active |
| US9290827B2 | Method of leaching copper and gold from sulfide ores | Emerging Cross-Sectional Technologies | 14 | Active |
| US8865119B2 | Method for processing acidic solution that contains iodide ions and iron ions | Emerging Cross-Sectional Technologies | 14 | Active |
| US8568576B2 | Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material | Chemistry; Metallurgy | 13 | Active |
| US8425696B2 | Sputtering target | Chemistry; Metallurgy | 12 | Active |
| US8172960B2 | Tantalum sputtering target and method of manufacturing same | Chemistry; Metallurgy | 11 | Active |
| US7892367B2 | Tantalum sputtering target | Chemistry; Metallurgy | 11 | Active |
| US9090481B2 | Positive electrode active material for lithium-ion battery, positive electrode for lithium-ion battery, and lithium-ion battery | Emerging Cross-Sectional Technologies | 10 | Active |
| US8142905B2 | Copper foil for printed circuit board and copper clad laminate for printed circuit board | Emerging Cross-Sectional Technologies | 10 | Active |
| US8177947B2 | Sputtering target | Chemistry; Metallurgy | 10 | Active |
| US8246764B2 | Copper alloy sputtering target and semiconductor element wiring | Electricity | 9 | Active |
| US9045823B2 | Sintered oxide compact target for sputtering and process for producing the same | Electricity | 8 | Active |
| US10123433B2 | Carrier-attached copper foil, laminate, method for manufacturing printed-wiring board and method for manufacturing electronic device | Emerging Cross-Sectional Technologies | 8 | Active |
| US9955583B2 | Surface-treated copper foil, copper foil with carrier, substrate, resin substrate, printed wiring board, copper clad laminate and method for producing printed wiring board | Electricity | 8 | Active |
| US8216442B2 | Ultrahigh-purity copper and process for producing the same | Emerging Cross-Sectional Technologies | 7 | Active |
| US8252422B2 | Hybrid silicon wafer and method of producing the same | Emerging Cross-Sectional Technologies | 7 | Active |
| US8728358B2 | Sintered compact, amorphous film and crystalline film of composite oxide, and process for producing the films | Chemistry; Metallurgy | 7 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.