Three-dimensional CMOS circuit on two offset substrates and method for making same
US8569801B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 10, 2009 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Jan 13, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D88/01
Abstract
A three-dimensional CMOS circuit having at least a first N-conductivity field-effect transistor and a second P-conductivity field-effect transistor respectively formed on first and second crystalline substrates. The first field-effect transistor is oriented, in the first substrate, with a first secondary crystallographic orientation. The second field-effect transistor is oriented, in the second substrate, with a second secondary crystallographic orientation. The orientations of the first and second transistors form a different angle from the angle formed, in one of the substrates, by the first and second secondary crystallographic directions. The first and second substrates are assembled vertically.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.