Illumination-source shape definition in optical lithography
US8572522B2 · kind B2 · utility
10Cited by
2References
12Claims
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Key dates
| Filing date | Sep 14, 2012 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Sep 14, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70441
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system are described for determining lithographic processing conditions for a lithographic process. After obtaining input, a first optimization is made for illumination source and mask design under conditions of allowing non-rectangular sub-resolution assist features. Thereafter, mask design is optimized in one or more further optimizations for which only rectangular sub-resolution assist features are allowed. The latter results in good lithographic processing while limiting the complexity of the mask design.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.