Showerhead electrode
US8573152B2 · kind B2 · utility
572Cited by
86References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 3, 2010 |
| Grant date | Nov 5, 2013 |
| Priority date | — |
| Expiry date | Jul 21, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/53204
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.