Method of detecting abnormal placement of substrate, substrate processing method, computer-readable storage medium, and substrate processing apparatus
US8581153B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2009 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Mar 20, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of detecting an abnormal placement of a substrate W, which is carried out when a substrate W placed on a substrate table 3, in which a heater 6a, 6b is disposed, is processed by heating. The method of detecting an abnormal placement of the substrate comprises the steps of: during processing of the substrate W, based on information about an electric output to the heater 6a, 6b or information about a measured temperature of the substrate table 3, detecting of a maximum value and a minimum value of the electric output or the measured temperature, or an integrated value of the electric output or the measured temperature; and judging of the abnormal placement of the substrate based on the maximum value and the minimum value detected, or the integrated value detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.