Focused ion beam system and sample processing method using the same
US8581206B2 · kind B2 · utility
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4Claims
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Key dates
| Filing date | Feb 17, 2010 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Sep 15, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/208
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.