Photomask cleaning apparatus and methods of cleaning a photomask using the same
US8585391B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2011 |
| Grant date | Nov 19, 2013 |
| Priority date | — |
| Expiry date | Feb 8, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2103/56
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A photomask cleaning apparatus includes a photomask receiving stage and a laser supply unit. The photomask receiving stage is configured to receive and retain a photomask in a desired orientation. The photomask has a front face having a pellicle adhesive residue region thereon. The desired orientation is with the front face positioned to allow gravity to move particles on the front face away from the front face without interference from the front face of the photomask. The laser supply unit is configured to generate a laser beam that irradiates a target region on the front face of the photomask to remove a pellicle adhesive residue from the target region. The photomask cleaning apparatus is configured to move the target region on the front face of the photomask to irradiate the entire pellicle adhesive residue region. Methods of using the photomask cleaning apparatus are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.