(Al, In, Ga, B)N device structures on a patterned substrate
US8592802B2 · kind B2 · utility
0Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2012 |
| Grant date | Nov 26, 2013 |
| Priority date | — |
| Expiry date | Apr 24, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/825
Abstract
A nitride light emitting diode, on a patterned substrate, comprising a nitride interlayer having at least two periods of alternating layers of InxGa1-xN and InyGa1-yN where 0<x<1 and 0≦y<1, and a nitride based active region having at least one quantum well structure on the nitride interlayer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.