Microlithographic projection exposure apparatus and related method
US8593645B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 20, 2011 |
| Grant date | Nov 26, 2013 |
| Priority date | — |
| Expiry date | Apr 2, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70116
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A microlithographic projection exposure apparatus includes an optical surface and a measurement device which measures a parameter related to the optical surface at a plurality of separated areas on the optical surface. The measurement device includes an illumination unit which directs individual measuring light beams towards the areas on the optical surface. Each measuring light beam illuminates at least a portion of an area, which is associated with the measuring light beam, and at least a portion of an adjacent area which is not associated with the measuring light beam. A detector unit measures a property for each measuring light beam after it has interacted with the optical surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.