Michael Patra
69Patents
5h-index
46Co-inventors
68Inventor score
Filing activity: Jul 21, 2009 → Feb 27, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9013684B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 15 | Active |
| US9599904B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 14 | Active |
| US8339577B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 6 | Active |
| US9989766B2 | Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens | Physics | 5 | Active |
| US8467031B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 5 | Active |
| US9046786B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 4 | Active |
| US8854604B2 | Microlithographic projection exposure apparatus | Physics | 4 | Active |
| US8724086B2 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Physics | 3 | Active |
| US9310694B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 3 | Active |
| US9989767B2 | Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens | Physics | 3 | Active |
| US9161426B2 | EUV light source | Electricity | 2 | Active |
| US8593645B2 | Microlithographic projection exposure apparatus and related method | Physics | 2 | Active |
| US9678438B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9645501B2 | Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unit | Electricity | 2 | Active |
| US9823571B2 | EUV light source for a lighting device of a microlithographic projection exposure apparatus | Electricity | 2 | Active |
| US9880474B2 | System for producing structures in a substrate | Physics | 2 | Active |
| US9213244B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9477157B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9612540B2 | Method of operating a microlithographic apparatus | Physics | 2 | Active |
| US9612537B2 | Illumination optical unit for EUV projection lithography | Physics | 1 | Active |
| US9791784B2 | Assembly for a projection exposure apparatus for EUV projection lithography | Physics | 1 | Active |
| US10928733B2 | Illumination optic for projection lithography | Physics | 1 | Active |
| US9897925B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US8896816B2 | Projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source | Electricity | 1 | Active |
| US9280061B2 | Illumination optical unit for EUV projection lithography | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.