Patent · US Active

Particle beam system

US8598525B2 · kind B2 · utility

22Cited by

10References

21Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Dirk Zeidler · Oberkochen, DE
Thomas Kemen · Meppen, DE

Key dates

Filing date	Jul 6, 2011
Grant date	Dec 3, 2013
Priority date	—
Expiry date	Jan 22, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2605
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A particle beam system comprises a particle beam source for generating a particle beam, an objective lens for focusing the particle beam onto an object plane, wherein the objective lens comprises a focal length and an optical axis, and a scintillator arrangement, which comprises an electron receiving surface facing the object plane and which is arranged such that it is exposed to electrons, which emanate from the object plane. The scintillator arrangement further comprises a light exit face, wherein the scintillator arrangement is configured such that light rays which are generated by electrons, which are incident on the electron receiving surface leave the scintillator arrangement at the light exit face.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.