Patent · US Active

Compensated isolated p-well DENMOS devices

US8604543B2 · kind B2 · utility

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Assignee

Inventors

Key dates

Filing dateJun 29, 2012
Grant dateDec 10, 2013
Priority date
Expiry dateJun 29, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/856

Abstract

An integrated circuit with a core PMOS transistor formed in a first n-well and an isolated DENMOS (iso-DENMOS) transistor formed in a second n-well where the depth and doping of the first and second n-wells are the same. A method of forming an integrated circuit with a core PMOS transistor formed in a first n-well and an iso-DENMOS transistor formed in a second n-well where the depth and doping of the first and second n-wells are the same.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.