Lithographic projection objective

US8605253B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Olaf Rogalsky · Oberkochen, DE
• Boris Bittner · Roth, DE
• Thomas Petasch · Aalen, DE
• Jochen Haeussler · Hermaringen, DE

Key dates

• Filing date: Dec 15, 2008
• Grant date: Dec 10, 2013
• Expiry date: Nov 10, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70975
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Projection objectives, related systems and components, and methods are disclosed. The methods include providing a projection objective of a lithography projection exposure apparatus, where the projection objective includes a plurality of optical elements between an object plane of the projection objective and an image plane of the projection objective, and the plurality of optical elements includes a first optical element having a refractive power and being disposed in the projection objective at a first location. The methods also include removing the first optical element from the projection objective, and inserting a first spare optical element into the projection objective at the first location, where the removing and inserting steps are performed at a location of use of the lithography projection exposure apparatus in a lithography process.