Boris Bittner
41Patents
4h-index
48Co-inventors
59Inventor score
Filing activity: Jan 9, 2008 → Aug 4, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7830611B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 17 | Active |
| US8203696B2 | Projection exposure apparatus with optimized adjustment possibility | Physics | 16 | Active |
| US9170497B2 | Projection exposure apparatus with at least one manipulator | Physics | 5 | Active |
| US9939730B2 | Optical assembly | Physics | 4 | Active |
| US7990622B2 | Projection objective of a microlithographic projection exposure apparatus | Physics | 3 | Active |
| US9134613B2 | Illumination and displacement device for a projection exposure apparatus | Physics | 3 | Active |
| US9760019B2 | Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus | Physics | 3 | Active |
| US8605253B2 | Lithographic projection objective | Physics | 2 | Active |
| US9910364B2 | Projection exposure apparatus including at least one mirror | Physics | 2 | Active |
| US10401540B2 | Optical element having a coating for influencing heating radiation and optical arrangement | Physics | 2 | Active |
| US9377694B2 | Projection arrangement | Physics | 2 | Active |
| US10018907B2 | Method of operating a microlithographic projection apparatus | Physics | 2 | Active |
| US10001631B2 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Emerging Cross-Sectional Technologies | 2 | Active |
| US9494868B2 | Lithographic projection objective | Physics | 1 | Active |
| US10303063B2 | Projection exposure apparatus with at least one manipulator | Physics | 1 | Active |
| US10474036B2 | Optical element and optical arrangement therewith | Physics | 1 | Active |
| US9354524B2 | Projection exposure apparatus with optimized adjustment possibility | Physics | 1 | Active |
| US9348234B2 | Microlithographic apparatus | Physics | 1 | Active |
| US10151922B2 | Wavefront correction element for use in an optical system | Electricity | 1 | Active |
| US9164402B2 | Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus | Physics | 1 | Active |
| US9372411B2 | Projection objective of a microlithographic projection exposure apparatus | Electricity | 1 | Active |
| US9846367B2 | Projection exposure apparatus with at least one manipulator | Physics | 1 | Active |
| US8174676B2 | Method for correcting a lithography projection objective, and such a projection objective | Physics | 1 | Active |
| US9927714B2 | Projection exposure apparatus with at least one manipulator | Physics | 1 | Active |
| US10261425B2 | Projection exposure apparatus with a highly flexible manipulator | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.