Purge ring with split baffles for photonic thermal processing systems
US8608035B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 20, 2011 |
| Grant date | Dec 17, 2013 |
| Priority date | — |
| Expiry date | Mar 16, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0318
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A purge ring for a photonic temperature processing system includes a first layer, a second layer, and a third layer. The first layer, the second layer and the third layer define an inner region. The first layer and the second layer define a first plenum and a first baffle. The first plenum receives a first gas that flows through the first plenum and the first baffle to the inner region. The second layer and the third layer define a second plenum and a second baffle. The second plenum receives a second gas that flows through the second plenum and the second baffle to the inner region, and wherein the second baffle is one of less restrictive and more restrictive than the first baffle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.