Particle sticking prevention apparatus and plasma processing apparatus
US8608422B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2004 |
| Grant date | Dec 17, 2013 |
| Priority date | — |
| Expiry date | May 6, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0048
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In order to prevent particles within a unit from sticking to a substrate in a substrate processing process, an ion generator charges the particles. At the same time, a direct current voltage of the same polarity as the charged polarity of the particles is applied from a direct current power source to the substrate. In order to prevent generation of particles when producing gas plasma, a high-frequency voltage is applied to the upper and lower electrodes at multiple stages to produce plasma. In other words, at a first step, a minimum high-frequency voltage at which plasma can be ignited is applied to the upper and lower electrodes, thereby producing a minimum plasma. Thereafter, the applied voltage is increased in stages to produce predetermined plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.