Photoacid generators and photoresists comprising same
US8609891B2 · kind B2 · utility
5Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2011 |
| Grant date | Dec 17, 2013 |
| Priority date | — |
| Expiry date | Aug 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure —C(═O)N<. Photoresist compositions also are provided that comprise one or more PAGs of the invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.