Apparatus and method for indirect surface cleaning
US8613803B2 · kind B2 · utility
1Cited by
25References
20Claims
0Family size
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Key dates
| Filing date | Oct 22, 2012 |
| Grant date | Dec 24, 2013 |
| Priority date | — |
| Expiry date | Oct 22, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, the surface of a substrate having a contaminating particulate disposed thereon is cleaned by directing a laser towards the substrate, generating a temperature increase in the substrate and transferring thermal energy from the substrate to the particulate to decompose the particulate. The laser has a wavelength that is substantially the same as a local maximum of the substrate absorption spectrum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.