Patent · US Active

Salt and photoresist composition containing the same

US8614046B2 · kind B2 · utility

0Cited by

5References

11Claims

0Family size

Assignee

SUMITOMO CHEMICAL COMPANY, LIMITED · JP

Inventors

Koji Ichikawa · Kaisei, JP
Masako Sugihara · Nishinomiya, JP
Yuko Yamashita · Tokyo, JP

Key dates

Filing date	Jul 9, 2010
Grant date	Dec 24, 2013
Priority date	—
Expiry date	Nov 5, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/123
WIPO fieldOrganic fine chemistry
WIPO sectorChemistry

Abstract

A salt represented by the formula (I-Pa):wherein Xpa represents a single bond or a C1-C4 alkylene group,

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.