Polymers, photoresist compositions and methods of forming photolithographic patterns
US8614050B2 · kind B2 · utility
3Cited by
3References
14Claims
0Family size
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Key dates
| Filing date | Dec 31, 2011 |
| Grant date | Dec 24, 2013 |
| Priority date | — |
| Expiry date | Feb 27, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polymers include a unit comprising a particular acetal moiety and a unit comprising a lactone moiety, photoresist compositions containing such a polymer, substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.