Patent · US Active

Pattern generators, calibration systems and methods for patterning workpieces

US8614798B2 · kind B2 · utility

0Cited by
11References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 5, 2013
Grant dateDec 24, 2013
Priority date
Expiry dateJun 5, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F9/7076
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A pattern generator includes: a writing tool and a calibration system. The writing tool is configured to generate a pattern on a workpiece arranged on a stage. The calibration system is configured to determine a correlation between a coordinate system of the writing tool and a coordinate system of a calibration plate on one of the stage and the workpiece. The calibration system is also configured to determine the correlation at least partly based on an optical correlation signal, or pattern, in a form of at least one optical beam being reflected from at least one reflective pattern on the surface of the calibration plate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.