Patent · US Active

Optimized mask design for fabricating periodic and quasi-periodic patterns

US8617775B2 · kind B2 · utility

4Cited by
0References
21Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 14, 2010
Grant dateDec 31, 2013
Priority date—
Expiry dateSep 14, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/26
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.