Lithographic apparatus and device manufacturing method
US8619235B2 · kind B2 · utility
5Cited by
22References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 10, 2011 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | Oct 10, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7096
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A level sensor configured to measure a height level of a substrate arranged in a measurement position is disclosed. The level sensor comprises a projection unit to project multiple measurement beams on multiple measurement locations on the substrate, a detection unit to receive the measurement beams after reflection on the substrate, and a processing unit to calculate a height level on the basis of the reflected measurement beams received by the detection unit, wherein the projection unit and the detection unit are arranged next to the substrate, when the substrate is arranged in the measurement position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.