Patent · US Active

Methods and systems for removing a material from a sample

US8623230B2 · kind B2 · utility

2Cited by

27References

37Claims

0Family size

Assignee

Carl Zeiss SMS Ltd. · IL

Inventors

Nicole Auth · Gustavsburg, DE
Petra Spies · Mainz, DE
Tristan Bret · Darmstadt, DE
Rainer Becker · Pfungstadt, DE
Thorsten Hofmann · Rodgau, DE
Klaus Edinger · Lorsch, DE

Key dates

Filing date	Dec 18, 2008
Grant date	Jan 7, 2014
Priority date	—
Expiry date	Dec 1, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

The present method relates to processes for the removal of a material from a sample by a gas chemical reaction activated by a charged particle beam. The method is a multiple step process wherein in a first step a gas is supplied which, when a chemical reaction between the gas and the material is activated, forms a non-volatile material component such as a metal salt or a metaloxide. In a second consecutive step the reaction product of the first chemical reaction is removed from the sample.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.