Patent · US Active

Measuring and controlling parameters of a plasma generator

US8624501B2 · kind B2 · utility

48Cited by
6References
31Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 8, 2010
Grant dateJan 7, 2014
Priority date
Expiry dateMar 22, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32174
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Methods, systems, and computer program products are described for measuring and controlling parameters of a plasma generator. A current in a primary winding of a transformer or inductive element that generates a plasma is measured. A voltage across a secondary winding of the transformer or inductive element is measured. Based on the current of the primary winding and the voltage across the secondary winding, a parameter of the plasma is determined. The parameter includes a resistance value associated with the plasma, a power value associated with the plasma, or both.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.