Polymers, photoresist compositions and methods of forming photolithographic patterns
US8628911B2 · kind B2 · utility
4Cited by
2References
11Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Dec 2, 2011 |
| Grant date | Jan 14, 2014 |
| Priority date | — |
| Expiry date | Jan 31, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/285
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.