Lithographic apparatus and device manufacturing method
US8629971B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2010 |
| Grant date | Jan 14, 2014 |
| Priority date | — |
| Expiry date | Oct 22, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.