Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition
US8637220B2 · kind B2 · utility
2Cited by
5References
14Claims
0Family size
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Key dates
| Filing date | Jun 29, 2011 |
| Grant date | Jan 28, 2014 |
| Priority date | — |
| Expiry date | Jul 10, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.