Reflective optical element and method of manufacturing the same
US8638494B2 · kind B2 · utility
2Cited by
6References
4Claims
0Family size
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Key dates
| Filing date | Mar 8, 2013 |
| Grant date | Jan 28, 2014 |
| Priority date | — |
| Expiry date | Mar 8, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/062
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the range from 5 nm to 12 nm, includes a multilayer system with respective layers of at least two alternating materials having differing real parts of the refractive index at the operating wavelength. The material having the lower real part of the refractive index is a nitride or a carbide. “Alternatively, the material having the lower real part of the refractive index is thorium, uranium or barium and the material having the higher real part of the refractive index is boron or boron carbide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.