Extrusion reduction in imprint lithography
US8641958B2 · kind B2 · utility
9Cited by
0References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2013 |
| Grant date | Feb 4, 2014 |
| Priority date | — |
| Expiry date | Jan 17, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2022
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.