Patent · US Active

Germanium ingots/wafers having low micro-pit density (MPD) as well as systems and methods for manufacturing same

US8647433B2 · kind B2 · utility

0Cited by
3References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 13, 2009
Grant dateFeb 11, 2014
Priority date
Expiry dateDec 11, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24355
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Systems and methods are disclosed for crystal growth including features of reducing micropit cavity density in grown germanium crystals. In one exemplary implementation, there is provided a method of inserting an ampoule with raw material into a furnace having a heating source, growing a crystal using a vertical growth process wherein movement of a crystallizing temperature gradient relative to the raw material/crucible is achieved to melt the raw material, and growing, at a predetermined crystal growth length, the material to achieve a monocrystalline crystal, wherein monocrystalline ingots having reduced micro-pit densities are reproducibly provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.