Patent · US Active

Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device

US8647810B2 · kind B2 · utility

1Cited by

9References

12Claims

0Family size

Assignee

JSR CORPORATION · JP

Inventors

Kazuo Nakahara · Tokyo, JP
Tomoki Nagai · Somalomo, CM

Key dates

Filing date	Sep 29, 2011
Grant date	Feb 11, 2014
Priority date	—
Expiry date	Dec 26, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/2041
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A resist lower layer film-forming composition includes (A) a polymer that includes a cyclic carbonate structure. The polymer (A) includes a structural unit (I) shown by the following formula (1).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.