Tomoki Nagai
50Patents
6h-index
60Co-inventors
71Inventor score
Filing activity: Sep 18, 2001 → Aug 24, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6908722B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 83 | Expired |
| US7812105B2 | Compound, polymer, and radiation-sensitive composition | Physics | 21 | Active |
| US7897821B2 | Sulfonium compound | Physics | 12 | Active |
| US7956142B2 | Polymerizable sulfonic acid onium salt and resin | Physics | 9 | Active |
| US6933094B2 | Radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6821705B2 | Radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 6 | Expired |
| US10018911B2 | Chemically amplified resist material and resist pattern-forming method | Electricity | 3 | Active |
| US8808446B2 | Composition for resist underlayer film and process for producing same | Emerging Cross-Sectional Technologies | 3 | Active |
| US8211624B2 | Method for pattern formation and resin composition for use in the method | Emerging Cross-Sectional Technologies | 3 | Active |
| US6830868B2 | Anthracene derivative and radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7202016B2 | Radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 2 | Expired |
| US9684235B2 | Directed self-assembling composition for pattern formation, and pattern-forming method | Performing Operations; Transporting | 2 | Active |
| US8440384B2 | Compound, salt, and radiation-sensitive resin composition | Chemistry; Metallurgy | 2 | Active |
| US8968458B2 | Composition for resist underlayer film and process for producing same | Emerging Cross-Sectional Technologies | 2 | Active |
| US9587065B2 | Composition for pattern formation, and pattern-forming method | Physics | 2 | Active |
| US8273837B2 | Compound, polymer, and resin composition | Chemistry; Metallurgy | 1 | Active |
| US7488566B2 | Positive type radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 1 | Expired |
| US9718950B2 | Directed self-assembly composition for pattern formation and pattern-forming method | Chemistry; Metallurgy | 1 | Active |
| US8026039B2 | Radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 1 | Active |
| US8647810B2 | Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device | Physics | 1 | Active |
| US7335457B2 | Positive-tone radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 1 | Expired |
| US10073349B2 | Chemically amplified resist material, pattern-forming method, compound, and production method of compound | Chemistry; Metallurgy | 1 | Active |
| US10308752B2 | Block copolymer | Performing Operations; Transporting | 1 | Active |
| US6846607B2 | Carbazole derivative and chemically amplified radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 1 | Expired |
| US9599892B2 | Composition for pattern formation, and pattern-forming method | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.