Patent · US Active

Method for operating a vacuum plasma process system

US8653405B2 · kind B2 · utility

1Cited by

6References

25Claims

0Family size

Assignee

HUETTINGER Elektronik GmbH + Co. KG · DE

Inventors

Thomas Kirchmeier · Teningen, DE
Michael Glück · Hamburg, DE
Christoph Hofstetter · Teningen, DE
Gerd Hintz · Schallstadt, DE

Key dates

Filing date	Nov 13, 2006
Grant date	Feb 18, 2014
Priority date	—
Expiry date	Jun 5, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01S3/0975
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In one aspect, operating a vacuum plasma process system including a plasma discharge chamber is accomplished by generating a main plasma in the discharge chamber in a first operating state, and generating an auxiliary plasma in the discharge chamber in a second operating state. Generating the main plasma includes generating a main plasma power with a first number of RF power generators, and generating an auxiliary plasma power with a second number of RF power generators, such that the second number is smaller than the first number.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.