Electromagnetic field application system
US8653472B2 · kind B2 · utility
1Cited by
1References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2010 |
| Grant date | Feb 18, 2014 |
| Priority date | — |
| Expiry date | Oct 10, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention is based on the property that the electric and magnetic fields are independent of each other and normal to each other and the property that the deflection of a charged particle beam by the electromagnetic field follows the rule of linear combination. The present invention employs a system that creates a region in which there exist both electromagnetic field and controls the deflection of a charged particle beam in each of the electric and magnetic fields.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.