Patent · US Active

Method and system for characterizing a plasma

US8660805B2 · kind B2 · utility

1Cited by

0References

20Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Ronald Victor Bravenec · Austin, US
Jianping Zhao · Xi'an, CN

Key dates

Filing date	Oct 4, 2011
Grant date	Feb 25, 2014
Priority date	—
Expiry date	Aug 15, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32954
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Disclosed are a method and system for measuring the electron energy distribution function (EEDF) in a plasma which has a pronounced drifting Maxwellian component of the EEDF. The method comprises fitting an acquired unfiltered electron current vs. bias voltage curve to a functional form which assumes an EEDF comprising at least one stationary Maxwellian component and at least one drifting Maxwellian component. The method and system allow more accurate characterization of plasmas with electron components with pronounced drift, such as plasmas in microwave surface wave plasma (SWP) sources.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.