Patent · US Active

Indium oxide sintered compact and sputtering target

US8664136B2 · kind B2 · utility

0Cited by
2References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 1, 2009
Grant dateMar 4, 2014
Priority date
Expiry dateAug 13, 2029

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC04B2235/786
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A sintered body includes an indium oxide crystal, and an oxide solid-dissolved in the indium oxide crystal, the oxide being oxide of one or more metals selected from the group consisting of aluminum and scandium, the sintered body having an atomic ratio “(total of the one or more metals)/(total of the one or more metals and indium)×100)” of 0.001% or more and less than 45%.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.